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Journal of Micro/Nanolithography, MEMS, and MOEMS

Advantage and feasibility of immersion lithography
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Paper Abstract

Immersion lithography has an advantage in the numerical aperture of optics by a factor of refractive index n of the liquid filled into the space between the bottom lens and wafer. In case of 193-nm exposure tools, water (n = 1.44) has been found as the best liquid. It is shown, by using imaging simulations, that ArF (193-nm) immersion lithography (NA = 1.05 to 1.23) has almost equivalent performance to F2 (157-nm) dry (NA = 0.85 to 0.93) lithography. Issues in the ArF immersion exposure tools are discussed with fluid-dynamic and thermal simulations results. In the fundamental issues, there seems to be no showstoppers so far, however, there exist several challenges to realize viable exposure tools.

Paper Details

Date Published: 1 January 2004
PDF: 7 pages
J. Micro/Nanolith. 3(1) doi: 10.1117/1.1637593
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 3, Issue 1
Show Author Affiliations
Soichi Owa, Nikon Corp. (Japan)
Hiroyuki Nagasaka, Nikon Corp. (Japan)


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