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Optical Engineering

Fabrication method of Bragg gratings in silica channel optical waveguides
Author(s): Tomiyuki Arakawa; Yutaka Uno; Hideaki Ono; Hiromi Takahashi; Kentaro Harase; Hideaki Okayama
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Paper Abstract

Strong Bragg gratings are realized in silica channel optical channel waveguides by plasma-enhanced chemical vapor deposition and reactive ion etching. In the gratings, the insertion of 0.2-μm-thick SiO2 layers with a relatively low refractive index between the cores and claddings successfully yields high reflectance, high extinction ratio, and low polarization dependence.

Paper Details

Date Published: 1 December 2003
PDF: 2 pages
Opt. Eng. 42(12) doi: 10.1117/1.1625679
Published in: Optical Engineering Volume 42, Issue 12
Show Author Affiliations
Tomiyuki Arakawa, Oki Electric Industry Co. Ltd. (Japan)
Yutaka Uno, Oki Electric Industry Co Ltd (Japan)
Hideaki Ono, Oki Electric Industry Co., Ltd. (Japan)
Hiromi Takahashi, Oki Electric Industry Co Ltd (Japan)
Kentaro Harase, Oki Electric Industry Co Ltd (Japan)
Hideaki Okayama, Oki Electric Industry Co., Ltd. (Japan)


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