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Optical Engineering

Fabrication of optical structures using SU-8 photoresist and chemically assisted ion beam etching
Author(s): Lin Pang; Wataru Nakagawa; Yeshaiahu Fainman
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Paper Abstract

We develop a method for the fabrication of optical structures in GaAs substrates using UV holographic lithography in SU-8 resist, processed to fabricate a mask, followed by chemically assisted ion-beam etching (CAIBE). The technique is based on simple processing steps without procedures of mask transfer, enabling easy fabrication of optical structures. A predevelopment relief behavior is investigated to optimize the processing parameter to form an etching mask in SU-8. By adjusting both exposure dose and time in the postexposure bake (PEB), an SU-8 mask with a flexible duty cycle and high profile quality can be easily produced. Furthermore, an optical structure with a rectangular shaped profile and a 1-μm period in a GaAs substrate is produced by optimizing the processing parameters during the CAIBE process.

Paper Details

Date Published: 1 October 2003
PDF: 6 pages
Opt. Eng. 42(10) doi: 10.1117/1.1604399
Published in: Optical Engineering Volume 42, Issue 10
Show Author Affiliations
Lin Pang, Univ. of California/San Diego (United States)
Wataru Nakagawa, Univ. of California/San Diego (United States)
Yeshaiahu Fainman, Univ. of California/San Diego (United States)


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