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Journal of Micro/Nanolithography, MEMS, and MOEMS

The 157-nm Good/Bad News from Intel
Author(s): Burn J. Lin
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Paper Details

Date Published: 1 July 2003
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J. Micro/Nanolith. MEMS MOEMS 2(3) doi: 10.1117/1.1596195
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 2, Issue 3
Show Author Affiliations
Burn J. Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)


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