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Journal of Micro/Nanolithography, MEMS, and MOEMS

Design and fabrication of microlens and spatial filter array by self-alignment for maskless lithography systems
Author(s): Ren Yang; Kin Foong Chan; Zhiqiang Feng; Ishikawa Akihito; WenHui Mei
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Paper Abstract

Maskless lithography systems (MLS) presented feature the digital mirror device (DMD) as the pattern generator to replace photomasks. Here 1.5-μm, 10-μm, and 20-μm line/space MLSs are developed. In the MLS, an 848×600 microlens and spatial filter array (MLSFA) was used to focus the light and filter the noise. The MLSFA produces light pads smaller than the 17-μm×17-μm micro mirrors of the SVGA DMD, and filters the noise produced from the DMD, optical lens system, and microlens array. This MLSFA is one of the key components for the Maskless Lithography System, and determines the resolution and quality of maskless lithography. A novel design and fabrication process of a single-package MLSFA for the Maskless Lithography System is introduced. To avoid problems produced by misalignment between a two-piece spatial filter and microlens array, MEMS processes are used to integrate the microlens array with the spatial filter array. In this paper, a self-alignment method used to fabricate exactly matched MLSFA is presented.

Paper Details

Date Published: 1 July 2003
PDF: 10 pages
J. Micro/Nanolith. 2(3) doi: 10.1117/1.1584445
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 2, Issue 3
Show Author Affiliations
Ren Yang, Ball Semiconductor, Inc. (United States)
Kin Foong Chan
Zhiqiang Feng, Ball Semiconductor, Inc. (United States)
Ishikawa Akihito, Ball Semiconductor, Inc. (United States)
WenHui Mei, Ball Semiconductor, Inc. (United States)


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