Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS

Understanding chromatic aberration impacts on lithographic imaging
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 April 2003
PDF: 7 pages
J. Micro/Nanolith. MEMS MOEMS 2(2) doi: 10.1117/1.1562929
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 2, Issue 2
Show Author Affiliations
Kafai Lai, IBM Corp. (United States)
Ivan Lalovic, Cymer, Inc. (United States)
Robert H. Fair, IBM Microelectronics Div. (United States)
Armen Kroyan, Cymer, Inc. (United States)
Christopher J. Progler, Cymer, Inc. (United States)
Nigel R. Farrar, Cymer, Inc. (United States)
Dennis B. Ames, IBM Microelectronics Div. (United States)
Khurshid Ahmed, Cymer, Inc. (United States)


© SPIE. Terms of Use
Back to Top