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Journal of Micro/Nanolithography, MEMS, and MOEMS

Understanding chromatic aberration impacts on lithographic imaging
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Paper Details

Date Published: 1 April 2003
PDF: 7 pages
J. Micro/Nanolith. MEMS MOEMS 2(2) doi: 10.1117/1.1562929
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 2, Issue 2
Show Author Affiliations
Kafai Lai, IBM Corp. (United States)
Ivan Lalovic, Cymer, Inc. (United States)
Robert H. Fair, IBM Microelectronics Div. (United States)
Armen Kroyan, Cymer, Inc. (United States)
Christopher J. Progler, Cymer, Inc. (United States)
Nigel R. Farrar, Cymer, Inc. (United States)
Dennis B. Ames, IBM Microelectronics Div. (United States)
Khurshid Ahmed, Cymer, Inc. (United States)

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