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Optical Engineering

Optical waveguide fabrication by combination of spin-on-glass and plasma-enhanced chemical vapor deposition for optoelectronic integration
Author(s): Tomiyuki Arakawa; Tatsushi Hasegawa; Masatoshi Kagawa
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Paper Abstract

Low-loss optical waveguides for optoelectronic integration were realized by the combination of spin-on-glass (SOG) and plasma-enhanced chemical vapor deposition (PECVD). Undercladdings of 20-μm thickness together with cores of 6-μm height and 8-μm width were formed on Si substrates by PECVD and reactive ion etching. Overcladdings were formed by a combination of SOG and PECVD SiO2 films. This method successfully filled narrow gaps between cores of optical circuits. The refractive index of overcladdings was adjusted by SOG curing and fluorine incorporation in PECVD SiO2 films. A buried-type optical waveguide formed by the combination of SOG and PECVD showed single-mode propagation. Propagation losses and polarization dependent losses at the 1.3-μm wavelength were measured to be 0.3 dB/cm and below 0.15 dB, respectively.

Paper Details

Date Published: 1 April 2003
PDF: 2 pages
Opt. Eng. 42(4) doi: 10.1117/1.1558392
Published in: Optical Engineering Volume 42, Issue 4
Show Author Affiliations
Tomiyuki Arakawa, Oki Electric Industry Co. Ltd. (Japan)
Tatsushi Hasegawa, Oki Electric Industry Co. Ltd. (Japan)
Masatoshi Kagawa, Oki Electric Industry Co. Ltd. (Japan)


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