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Optical Engineering

Simulation of the fabrication infidelity of diffractive-optical elements by using halftone gray-scale masks
Author(s): J. S. Liu; M. J. Thomson; Mohammad R. Taghizadeh
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Paper Abstract

A model is set up to simulate the fabrication infidelity of diffractive-optical elements using halftone gray-scale masks. The infidelity includes, for different spatial frequencies, variations in maximum exposure depth in photoresist, relative transition width between adjacent ramps, and nonlinearity. The attenuation of the modulation transfer function (MTF) of the fabrication system at a high spatial frequency is the main reason for all the fabrication infidelity. The component whose MTF attenuates most in the fabrication system is generally photoreduction.

Paper Details

Date Published: 1 February 2003
PDF: 6 pages
Opt. Eng. 42(2) doi: 10.1117/1.1532745
Published in: Optical Engineering Volume 42, Issue 2
Show Author Affiliations
J. S. Liu, Heriot-Watt Univ. (United Kingdom)
M. J. Thomson, Heriot-Watt Univ. (United Kingdom)
Mohammad R. Taghizadeh, Heriot-Watt Univ. (United Kingdom)

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