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Optical Engineering

Real-time photolithographic technique for fabrication of arbitrarily shaped microstructures
Author(s): Qinjun Peng; Shijie Liu; Yongkang Guo; Bo Chen; Jinglei Du; Yangsu Zeng; Chongxi Zhou; Zheng Cui
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Paper Abstract

A new photolithographic technique that combines the advantages of a programmable digital liquid crystal display (LCD) system and projection photolithography system to fabricate arbitrarily shaped microstructures using LCD panels as real-time masks is reported. Its principle and design method are explained. Based on a partial coherent imaging theory, the process to fabricate microaxicon arrays and zigzag gratings is simulated. The experiment has been set up using a color LCD as a real-time mask. Microaxicon arrays and zigzag gratings have been fabricated by a real-time photolithographic technique. The 3-D surface relief structures are made on panchromatic silver-halide sensitized gelatin (Kodak-131) with trypsinase etching. The pitch size of the zigzag grating is 46.26 μm, and the etching depth is 0.802 μm. The caliber of the axicon is 118.7 μm, and the etching depth is 1.332 μm.

Paper Details

Date Published: 1 February 2003
PDF: 5 pages
Opt. Eng. 42(2) doi: 10.1117/1.1531976
Published in: Optical Engineering Volume 42, Issue 2
Show Author Affiliations
Qinjun Peng, Sichuan Univ. (China)
Shijie Liu, Sichuan Univ. (China)
Yongkang Guo, Sichuan Univ. (China)
Bo Chen, Sichuan Univ. (China)
Jinglei Du, Sichuan Univ. (China)
Yangsu Zeng, Sichuan Univ. (China)
Chongxi Zhou, Institute of Optics and Electronics (China)
Zheng Cui, Rutherford Appleton Lab. (United Kingdom)


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