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Journal of Micro/Nanolithography, MEMS, and MOEMS

Aberration retrieval using the extended Nijboer-Zernike approach
Author(s): Peter Dirksen; Joseph J. M. Braat; Augustus Janssen; Casper A. H. Juffermans
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Paper Abstract

We give the proof of principle of a new experimental method to determine the aberrations of an optical system in the field. The measurement is based on the observation of the intensity point-spread function of the lens. To analyze and interpret the measurement, use is made of an analytical method, the so-called extended Nijboer-Zernike approach. The new method is applicable to lithographic projection lenses, but also to EUV mirror systems or microscopes such as the objective lens of an optical mask inspection tool. Phase retrieval is demonstrated both analytically and experimentally. The extension of the method to the case of a medium-to-large hole sized test object is presented. Theory and experimental results are given. In addition we present the extension to the case of aberrations comprising both phase and amplitude errors.

Paper Details

Date Published: 1 January 2003
PDF: 8 pages
J. Micro/Nanolith. 2(1) doi: 10.1117/1.1531191
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 2, Issue 1
Show Author Affiliations
Peter Dirksen, Philips Research Labs. (Belgium)
Joseph J. M. Braat, Technische Univ. Delft (Netherlands)
Augustus Janssen, Philips Research Labs. (Netherlands)
Casper A. H. Juffermans, Philips Research Labs. (Belgium)


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