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Journal of Micro/Nanolithography, MEMS, and MOEMS

Marathon evaluation of optical materials for 157-nm lithography
Author(s): Vladimir Liberman; Mordechai Rothschild; Nikolay N. Efremow; Stephen T. Palmacci; Jan H. C. Sedlacek; Andrew Grenville; Kevin J. Orvek
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Paper Abstract

We present the methodology and recent results on the long-term evaluation of optical materials for 157-nm lithographic applications. We review the unique metrology capabilities that have been developed for accurately assessing optical properties of samples both online and offline, utilizing VUV spectrophotometry with in situ lamp-based cleaning. We describe ultraclean marathon testing chambers that have been designed to decouple effects of intrinsic material degradation from extrinsic ambient effects. We review our experience with lithography-grade 157-nm lasers and detector durability. We review the current status of bulk materials for lenses, such as CaF2 and BaF2, and durability results of antireflectance coatings. Finally, we discuss the current state of laser durability of organic pellicles.

Paper Details

Date Published: 1 January 2003
PDF: 8 pages
J. Micro/Nanolith. 2(1) doi: 10.1117/1.1528948
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 2, Issue 1
Show Author Affiliations
Vladimir Liberman, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
Nikolay N. Efremow, MIT Lincoln Lab. (United States)
Stephen T. Palmacci, MIT Lincoln Lab. (United States)
Jan H. C. Sedlacek, MIT Lincoln Lab. (United States)
Andrew Grenville, International SEMATECH (United States)
Kevin J. Orvek, Intel Corp. (United States)

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