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Journal of Micro/Nanolithography, MEMS, and MOEMS

High-accuracy aerial image measurement for electron beam projection lithography
Author(s): Takehisa Yahiro; Noriyuki Hirayanagi; Takeshi Irita; Hiroyasu Shimizu; Kazuaki Suzuki
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Paper Abstract

A direct means of measuring the image blur of electron beam projection lithography (EPL) tools is described. We developed an aerial image sensor using a Si membrane knife-edge and a transmitted electron detection technique. The aerial image sensor is designed to increase signal amplitude and signal contrast in order to yield a large signal to noise ratio even under a low beam current density condition. The image blur can be quantified accurate to a few nanometers because the measurement error due to the sensor is extremely small. The aerial image sensor was installed in Nikon's electron beam projection experimental column and was evaluated. The measured image blur, defined as the distance between the 12% and 88% points of the beam edge profile, under the optimum condition was 13 nm, and the measurement repeatability was 3 nm (3 sigma). The application of this technique to a system calibration is demonstrated. Focus and astigmatism were measured and the optimum settings of focus coils and stigmators were determined with excellent repeatability. The potential for this technique to provide an automated self-calibration system on EPL tools is clearly shown.

Paper Details

Date Published: 1 July 2002
PDF: 8 pages
J. Micro/Nanolith. 1(2) doi: 10.1117/1.1451082
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 1, Issue 2
Show Author Affiliations
Takehisa Yahiro, Nikon Corp. (Japan)
Noriyuki Hirayanagi, Nikon Corp. (Japan)
Takeshi Irita, Nikon Corp. (Japan)
Hiroyasu Shimizu, Nikon Corp. (Japan)
Kazuaki Suzuki, Nikon Corp. (Japan)


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