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Optical Engineering

Fabrication of a waveguiding layer in Teflon AF by ion irradiation
Author(s): Markus Leitz; R. P. Podgorsek; Hilmar Franke; Daniel Hernandez Cruz; Emile J. Knystautas; Roger A. Lessard
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Paper Abstract

The modification of thin Teflon AF® films by He+ ion irradiation was investigated. As an integrated optical measurement technique, leaky-mode spectroscopy has been applied, and an increase of ?n = 8 x 10-3 for the real part of the refractive index has been found in the irradiated surface region of the film. The irradiated films can be regarded as a bilayer system consisting of a layer with low refractive index and a layer with high refractive index. The latter can be used as an optical waveguide with a substrate of unmodified Teflon AF. In addition, a decrease of the initial film thickness, an increase in UV absorption, and no significant increase in absorption of near-infrared light were found.

Paper Details

Date Published: 1 July 2001
PDF: 6 pages
Opt. Eng. 40(7) doi: 10.1117/1.1385331
Published in: Optical Engineering Volume 40, Issue 7
Show Author Affiliations
Markus Leitz, Univ. Duisburg (Germany)
R. P. Podgorsek, Univ. Duisburg (Germany)
Hilmar Franke, Univ. Duisburg (Germany)
Daniel Hernandez Cruz, Univ. Laval (Canada)
Emile J. Knystautas, Univ. Laval (Canada)
Roger A. Lessard, Univ. Laval (Canada)

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