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Optical Engineering

X-cut LiNbO3 optoelectronic device passivated by silicon nitride film
Author(s): Futoshi Yamamoto; Yasuyuki Miyama; Hirotoshi Nagata; Masumi Tamai
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Paper Details

Date Published: 1 June 2001
PDF: 4 pages
Opt. Eng. 40(6) doi: 10.1117/1.1367257
Published in: Optical Engineering Volume 40, Issue 6
Show Author Affiliations
Futoshi Yamamoto, Sumitomo Osaka Cement Co., Ltd. (Japan)
Yasuyuki Miyama, Sumitomo Osaka Cement Co., Ltd. (Japan)
Hirotoshi Nagata, Sumitomo Osaka Cement Co., Ltd. (Japan)
Masumi Tamai, Sumitomo Osaka Cement Co. Ltd. (Japan)


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