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Optical Engineering

Reduction of residual stress in extreme ultraviolet Mo/Si multilayer mirrors with post deposition thermal treatments
Author(s): Claude Montcalm
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Paper Details

Date Published: 1 March 2001
PDF: 9 pages
Opt. Eng. 40(3) doi: 10.1117/1.1346584
Published in: Optical Engineering Volume 40, Issue 3
Show Author Affiliations
Claude Montcalm, Lawrence Livermore National Lab. (United States)


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