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Optical Engineering

Evaluating the effects of thin film patterns on the temperature distribution of silican wafers during radiant processing
Author(s): Haruna Tada; Alexis Abramson; Seth E. Mann; Ioannis N. Miaoulis; Peter Y. Wong
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Paper Details

Date Published: 1 August 2000
PDF: 9 pages
Opt. Eng. 39(8) doi: 10.1117/1.1305525
Published in: Optical Engineering Volume 39, Issue 8
Show Author Affiliations
Haruna Tada, Tufts Univ. (United States)
Alexis Abramson, Tufts Univ. (United States)
Seth E. Mann, Tufts Univ. (United States)
Ioannis N. Miaoulis, Tufts Univ. (United States)
Peter Y. Wong, Tufts Univ. (United States)


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