Monterey Convention Center and Monterey Marriott
Monterey, California, United States
17 - 20 September 2018
Conference PM18
Photomask Technology
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Abstract Due:
2 May 2018

Author Notification:
25 June 2018

Manuscript Due Date:
22 August 2018


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Conference Chair
Conference Co-Chair
Program Committee
Program Committee continued...
Call for
SPIE Photomask Technology is a global forum for scientists, engineers, and industry leaders to present and discuss key topics related to photomasks. The conference addresses design, fabrication, quality control, and the use of photomasks in the semiconductor industry. EUV lithography is being driven toward HVM manufacturing, 193nm lithography tolerances are increasingly tight to enable multiple patterning solutions, and it is imperative to enhance productivity in both mask manufacturing excellence and mask integration in the wafer fab. At the same time, nanoimprint remains a technology of interest and research continues to develop new mask materials, inspection methods and high-NA EUV lithography. The photomask is increasingly recognized as a key enabler for lithographic solutions, or a potential detractor. This landscape brings together mask makers, chip manufacturers, design automation companies, tool manufacturers, and the academic and national research organizations. Information will be shared through the structured conference oral and poster sessions and the exhibition, but also informally through networking opportunities throughout the conference.

Papers that address all aspects of photomasks research, development manufacturing and use are solicited. This means that topics related to nanoimprint lithography, inverse lithography, high-NA, EUV, multi-patterning and established DUV are all of interest. Probable sessions include:

  • Design automation and data prep (DFM, OPC, ILT, ...)
  • Business, CoO, next generation masks (high NA, NIL, Etc.)
  • Mask write, corrections, process compensation (MPC)
  • Mask blanks (defects, manufacturing, and characterization)
  • Mask process (resist, etch, cleans, ...)
  • Metrology (CD, placement, flatness, AFM)
  • Defects: mask inspection, repair, verification
  • Defect control: strategies, pellicles, data management
  • Simulation and imaging: mask to wafer (stochastics, LER, SWA, roughness)
  • Lifetime, defectivity, verification and use in the wafer fab.
  • Machine learning (as applied to MPC, OPC, process control)

The conference will be held in the newly remodeled Monterey Convention Center. As was the case in 2017, SPIE Photomask 2018 will be organized with the EUVL Symposium in Monterey, California (USA). Joint sessions will be organized on topics related to EUV masks.

As Conference Chairs, we urge you to participate in our 38th year by submitting your abstract(s), and to encourage your colleagues to do the same. Also encourage your company to continue their support for the Photomask Technology symposium.
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