San Diego Convention Center
San Diego, California, United States
28 August - 1 September 2016
Conference OP314
Advances in Metrology for X-Ray and EUV Optics VI
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Abstract Due:
8 February 2016

Author Notification:
25 April 2016

Manuscript Due Date:
1 August 2016

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Conference Chairs
Program Committee
  • Simon G. Alcock, Diamond Light Source Ltd. (United Kingdom)
  • Raymond Barrett, European Synchrotron Radiation Facility (France)
  • Daniele Cocco, SLAC National Accelerator Lab. (United States)
  • Ralf D. Geckeler, Physikalisch-Technische Bundesanstalt (Germany)
  • Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
  • Mikhail V. Gubarev, NASA Marshall Space Flight Ctr. (United States)
  • Mourad Idir, Brookhaven National Lab. (United States)
  • Weiguo Liu, Xi'an Univ. of Technology (China)
  • Hidekazu Mimura, The Univ. of Tokyo (Japan)
  • Josep Nicolas, CELLS - ALBA (Spain)
  • Lorenzo Raimondi, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)

Program Committee continued...
Call for
This conference will address the broad issues in the growing and very demanding field of surface metrology and characterization of optics for EUV/X-Ray synchrotron and FEL radiation and for other EUV/X-Ray applications such as astronomical imaging, solar physics, and lithography. Improving the performance of existing instrumentation and techniques, as well as developing new and novel ones, is critical for the fabrication of high-quality optics to meet current and future requirements for these applications.

Papers are solicited on the following and related topics:
  • surface figure and finish measurement
  • slope profilometry and interferometry
  • sub-aperture stitching
  • wavefront sensing and characterization
  • at-wavelength metrology of x-ray and EUV optics
  • metrology of x-ray astronomy optics
  • metrology of coherence-preserving mirrors
  • metrology data analysis software and error reduction
  • metrology of adaptive optics
  • mirror characterization using scattering techniques
  • mirror specification and tolerancing
  • novel instrumentation and techniques
  • mirror performance simulation using metrology data calibration tools and methods.
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