San Diego Convention Center
San Diego, California, United States
9 - 13 August 2015
Conference OP314
Advances in X-Ray/EUV Optics and Components X
Important
Dates
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Abstract Due:
26 January 2015

Author Notification:
6 April 2015

Manuscript Due Date:
15 July 2015

Conference
Committee
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Conference Chairs
  • Shunji Goto, Japan Synchrotron Radiation Research Institute (Japan)
  • Christian Morawe, European Synchrotron Radiation Facility (France)
  • Ali M. Khounsary, X-ray Optics, Inc. (United States), Illinois Institute of Technology (United States)

Program Committee
Program Committee continued...
Call for
Papers
Expanding use of x-ray and EUV radiation in many scientific and technical applications requires the continued development of new and improved sources and optics to deliver brighter, better-conditioned beams to the end-user. This conference focuses on the advances, as well as the emerging needs, in x-ray and EUV sources, optics, and applications including next-generation synchrotron sources, EUV photolithography, and x-ray astronomy.

In radiation to sources and source/optics integration, the topics covered include design, development, fabrication, installation, evaluation, and applications of optical elements such as mirrors, monochromators, multilayers, zone-plates, and lenses. It is also an aim of this conference to provide an opportunity for the developers and users to share both the progress and challenges in each of these and related areas.

Presentations on emerging needs, progress reports, and topical reviews covering the following and related topics are solicited:
  • x-ray sources (synchrotron, XFEL, etc...)
  • emerging needs in x-ray, XFEL, and EUV optics
  • novel optical substrates, materials, processes, and applications
  • crystal optics design, fabrication, and applications
  • x-ray and EUV mirror fabrication: surface figuring and finishing techniques, capabilities, and limitations
  • management of optical components under high heat/radiation load and in hostile environments
  • thermal and mechanical stability of optical systems
  • active/passive/adaptive shape control of optical elements
  • optical and x-ray metrology of optical substrates
  • coherence preservation and wave front quality
  • coating- and multilayer-based optics and performance
  • focusing optics including refractive, reflective, and diffrative optics
  • filters, windows, x-ray beam position monitors
  • x-ray optics for extreme spatial and / or energy resolution
  • x-ray optics software and simulation.
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