San Diego Convention Center
San Diego, California, United States
6 - 10 August 2017
Conference OP312
Advances in X-Ray/EUV Optics and Components XII
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Abstract Due:
23 January 2017

Author Notification:
3 April 2017

Manuscript Due Date:
10 July 2017

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Conference Chairs
Program Committee
Program Committee continued...
  • Howard A. Padmore, Lawrence Berkeley National Lab. (United States)
  • Ladislav Pina, Czech Technical Univ. in Prague (Czech Republic)
  • Yuriy Ya Platonov, Rigaku Innovative Technologies, Inc. (United States)
  • Seungyu Rah, Pohang Univ. of Science and Technology (Korea, Republic of)
  • Peter Revesz, Cornell Univ. (United States)
  • Horst Schulte-Schrepping, Deutsches Elektronen-Synchrotron (Germany)
  • Regina Soufli, Lawrence Livermore National Lab. (United States)
  • Daniele Spiga, INAF - Osservatorio Astronomico di Brera (Italy)
  • Stanislav Stoupin, Argonne National Lab. (United States)
  • Mau-Tsu Tang, National Synchrotron Radiation Research Ctr. (Taiwan)
  • Akihiko Ueda, JTEC Corp. (Japan)
  • Zhanshan Wang, Tongji Univ. (China)
  • Joerg Wiesmann, Incoatec GmbH (Germany)
  • Makina Yabashi, RIKEN (Japan), Japan Synchrotron Radiation Research Institute (Japan)
  • Kazuto Yamauchi, Osaka Univ. (Japan)
  • Brian W. Yates, Canadian Light Source Inc. (Canada)

Call for
Expanding use of x-ray and EUV radiation in many scientific and technical applications requires the continued development of new and improved sources and optics to deliver brighter, better-conditioned beams to the end-user. This conference focuses on the advances, as well as the emerging needs, in x-ray and EUV sources, optics, and applications including next-generation synchrotron sources, EUV photolithography, and x-ray astronomy.

In radiation to sources and source/optics integration, the topics covered include design, development, fabrication, installation, evaluation, and applications of optical elements such as mirrors, monochromators, multilayers, zone-plates, and lenses. It is also an aim of this conference to provide an opportunity for the developers and users to share both the progress and challenges in each of these and related areas.

Presentations on emerging needs, progress reports, and topical reviews covering the following and related topics are solicited:
  • x-ray sources (synchrotron, XFEL, etc...)
  • emerging needs in x-ray, XFEL, and EUV optics
  • novel optical substrates, materials, processes, and applications
  • crystal optics design, fabrication, and applications
  • x-ray and EUV mirror fabrication: surface figuring and finishing techniques, capabilities, and limitations
  • management of optical components under high heat/radiation load and in hostile environments
  • thermal and mechanical stability of optical systems
  • active/passive/adaptive shape control of optical elements
  • coherence preservation and wavefront quality
  • coating- and multilayer-based optics and performance
  • focusing optics including refractive, reflective, and diffractive optics
  • filters, windows, x-ray beam position monitors
  • x-ray optics for extreme spatial and/or energy resolution
  • x-ray optics software and simulation.
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