SPIE NanoScience + Engineering symposium provides the broad interdisciplinary reach you need to exploit the growth of commercial and research opportunities in nano sciences.
Begin submission process. Papers will be accepted in these areas:
NanoScience:
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| • | Metamaterials: Fundamentals and Applications |
| • | Nanophotonic Materials |
| • | Active Photonic Materials |
| • | Plasmonics: Metallic Nanostructures and their Optical Properties |
| • | Physical Chemistry of Interfaces and Nanomaterials |
| • | Biosensing |
| • | Spintronics |
| • | Carbon Nanotubes, Graphene, and Associated Devices |
| • | Optical Trapping and Optical Micromanipulation |
| • | Single-Photon Imaging |
| • | Terahertz Emitters, Receivers, and their Applications |
NanoEngineering:
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| • | Nanoengineering: Fabrication, Properties, Optics, and Devices |
| • | Optofluidics |
| • | Nanobiosystems: Processing, Characterization, and Applications |
| • | Nanostructured Thin Films |
| • | Instrumentation, Metrology, and Standards for Nanomanufacturing |
| • | Nanoepitaxy: Homo and Heterogeneous Synthesis, Characterization, and Device Integration of Nanomaterials |
| • | Solar Hydrogen and Nanotechnology |
| • | Nanoscale Photonic and Cell Technologies for Photovoltaics |
| • | Nanophotonics and Macrophotonics for Space Environments |
View conference details and chair profiles
Accepted Papers
If accepted, your research will be published in the
SPIE Digital Library and will be accessible to thousands of cutting-edge researchers.
Be a part of tomorrow's solutions.
We welcome your participation.
2010 Symposium Chairs
 | David L. Andrews, Univ. of East Anglia Norwich (United Kingdom) |  | James G. Grote, Air Force Research Lab. (United States)
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NanoScience + Engineering 2010 Technical Organizing Committee
Javier Atencia, National Institute of Standards and Technology (United States)
Allan D. Boardman, Univ. of Salford (United Kingdom)
Stefano Cabrini, Lawrence Berkeley National Lab. (United States)
Didier J. Decoster, Univ. des Sciences et Technologies de Lille (France)
Kishan Dholakia, Univ. of St. Andrews (United Kingdom)
Elizabeth A. Dobisz, Hitachi Global Storage Technologies, Inc. (United States)
Henri-Jean M. Drouhin, Ecole Polytechnique (France)
Louay A. Eldada, HelioVolt Corp. (United States)
Nader Engheta, Univ. of Pennsylvania (United States)
Stavroula Foteinopoulou, Univ. of Exeter (United Kingdom)
M. Saif Islam, Univ. of California, Davis (United States)
Yi-Jun Jen, National Taipei Univ. of Technology (Taiwan)
Nobuhiko P. Kobayashi, Univ. of California, Santa Cruz (United States)
Norihisa Kobayashi, Chiba Univ. (Japan)
Akhlesh Lakhtakia, The Pennsylvania State Univ. (United States)
Jean-François Lampin, Institut d'Electronique, de Microélectronique, et de Nanotechnologie (France)
Young-Hee Lee, Sungkyunkwan Univ. (Korea, Republic of)
Carlos Lopez-Mariscal, National Institute of Standards and Technology (United States)
Raúl J. Martin-Palma, Univ. Autónoma de Madrid (Spain)
Hooman Mohseni, Northwestern Univ. (United States)
Taleb Mokari, Lawrence Berkeley National Lab. (United States)
Mikhail A. Noginov, Norfolk State Univ. (United States)
Fahima Ouchen, Air Force Research Lab. (United States)
Jose Luis Pau Vizcaíno, Univ. Autónoma de Madrid (Spain)
Michael T. Postek, National Institute of Standards and Technology (United States)
Oleg V. Prezhdo, Univ. of Washington (United States)
Didier Pribat, Ecole Polytechnique (France)
Ileana Rau, Polytechnical Univ. of Bucharest (Romania)
Manijeh Razeghi, Northwestern Univ. (United States)
Gabriel C. Spalding, Illinois Wesleyan Univ. (United States)
Mark I. Stockman, Georgia State Univ. (United States)
Ganapathi S. Subramania, Sandia National Labs. (United States)
A. Alec Talin, National Institute of Standards and Technology (United States)
Melville P. Ulmer, Northwestern Univ. (United States)
Jean-Eric Wegrowe, Ecole Polytechnique (France)
Nikolay I. Zheludev, Univ. of Southampton (United Kingdom)
