Plan to attend SPIE Advanced Lithography 2009

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

See presentations on:

• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Resist Materials and Processing Technology
• Optical Microlithography
• Design for Manufacturability through Design-Process Integration

Register Today and save $100 over onsite pricing

Important information for all travelers to the United States
Effective January 12, 2009, the U.S. Department of Homeland Security will require all Visa Waiver Program nationals to obtain an electronic travel authorization prior to boarding. This new authorization is known as the Electronic System for Travel Authorization, or ESTA. Make sure you have all your correct travel documents.

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This unique international symposium offers many opportunities to network with colleagues from a variety of disciplines in academia, industry, and government. Detailed Program Information is now available online.

See plenary presentations from top experts:

•	Lisa T. Su, Senior Vice President and Chief Technology Officer for Freescale Semiconductor, Inc.
•	Gilad Almogy, Senior Vice President and General Manager for the Display and Thin Film Solar Products Business Group, Applied Materials, Inc.
•	Bernard S. Meyerson, Vice President for Strategic Alliances and Chief Technology Officer, IBM Systems and Technology Group

Collaborate with your colleagues
Over 4,000 colleagues from different disciplines and locations collaborate to move their fields forward.

Add to Your Skills with Courses + Training
Extend your education with a course from globally recognized experts. Put yourself and your team in control of the latest technology and techniques.

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