Author and Presenter Information

Post-Deadline Abstract Submissions:
Late abstracts may be accepted, subject to chair approval. Contact Pat Wight, the SPIE Advanced Lithography Conference Programs Coordinator. Be sure to specify to which individual conference you wish to submit.

1. Review the Technical Program 

Submission Guidelines (Conditions for Acceptance, Abstract Instructions, Program Placement, and Publication Information)

2. Prepare to Present at the Conference

• Visa application information and invitation letter requests
• Prepare your presentation:
  • Oral Presentation Guidelines
  • Poster Presentation Guidelines
• Apply for an SPIE Contingency Student Travel Grant (Only full-time students may apply for a supplemental travel grant.)
• Preregister for the conference.

Presentation Questions? Contact Pat Wight

Present a Better Paper. Take one of these new online courses from SPIE:

• Effective Technical Presentations
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3. Prepare and Submit Your Manuscript  

• SPIE Code of Ethics
• Manuscript Policies and Review Information
• Format your manuscript and view sample templates
• Submit your manuscript (The manuscript submission site will be open 5 weeks before the manuscript due date)
• Submit your copyright form
• Publication Charges Form (to order Color Pages for printed Proceedings)

Manuscript Questions? View SPIE Contacts

Publish Your Work!

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• Articles and citations are linked via CrossRef
• Publish your manuscript with attached multimedia files in SPIE Digital Library
• After publication in Proceedings of SPIE, expand and revise your paper and submit it to one of SPIE's peer-reviewed journals (http://spie.org/journals).