Take advantage of the unique opportunity to learn directly from industry legends and other experts in lithography design and manufacturing.
New courses for 2012 include Directed Self-Assembly (DSA), metrology with Atomic Force Microscopy (AFM), and Practical Modeling and Computational Lithography.
Online course registration is now closed, but onsite registration is available.
(Note: Prices for courses increased $50 on Jan. 28. The increase is not reflected in the pricing on this page, but will be when you register.)
Date: 12 February 2012
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor:
Hong Xiao, KLA-Tencor Corp. (United States)
$300.00 Members |
$355.00 Non-members
Date: 12 February 2012
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Murrae J. Bowden, EMP Consultants (United States);
C. Grant Willson, The Univ. of Texas at Austin (United States)
$525.00 Members |
$635.00 Non-members
Date: 16 February 2012
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Advanced
Instructor:
C. Grant Willson, Univ. of Texas/Austin (United States)
$525.00 Members |
$635.00 Non-members
Date: 13 February 2012
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor:
Chi-Min (Chi) Yuan, Freescale Semiconductor, Inc. (United States)
$300.00 Members |
$355.00 Non-members
Date: 12 February 2012
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor:
Chris A. Mack, Consultant (United States)
$575.00 Members |
$685.00 Non-members
Date: 16 February 2012
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor:
Ralph R. Dammel, AZ Electronic Materials USA Corp. (United States)
$300.00 Members |
$355.00 Non-members
Date: 14 February 2012
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor:
Mircea V. Dusa, ASML US, Inc. (United States);
Stephen D. Hsu, Brion Technologies, Inc. (United States)
$525.00 Members |
$635.00 Non-members
Date: 12 February 2012
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor:
Vivek Bakshi, EUV Litho, Inc. (United States);
Jinho Ahn, Hanyang Univ. (South Korea);
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
$755.00 Members |
$865.00 Non-members
Date: 12 February 2012
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor:
Qinghuang Lin, IBM Thomas J. Watson Research Ctr. (United States); Thorsten B. Lill, Applied Materials, Inc. (United States)
$525.00 Members |
$635.00 Non-members
Date: 12 February 2012
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor:
Vladimir A. Ukraintsev, Nanometrology International, Inc. (United States)
$300.00 Members |
$355.00 Non-members
Date: 12 February 2012
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor:
Kafai Lai, IBM Corp. (United States)
$525.00 Members |
$635.00 Non-members
Date: 12 February 2012
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Juan J. de Pablo,
Paul F. Nealey, Univ. of Wisconsin-Madison (United States);
Ricardo Ruiz, Hitachi Global Storage Technologies, Inc. (United States)
$300.00 Members |
$355.00 Non-members
