SPIE Photomask Technology 2008 has now concluded.
The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance hear the latest research on the emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.
Download the SPIE Photomask Technology 2008 Final Program PDF
Program information is now available on these technical areas:
- Mask Infrastructure
- Mask Integration
- Emerging Mask Technology
- Mask Business
Download the SPIE Photomask Technology Advance Program (PDF)*
*Current as of 20 June 2008
Keynote Presentation
Tuesday 7 October, 8:10 to 8:50 am | Dr. Aart J. de Geus
Chairman and CEO
Synopsys, Inc. |
Since co-founding Synopsys in 1986, Dr. Aart de Geus has expanded Synopsys from a start-up synthesis enterprise to a world leader in software and IP for semiconductor design and manufacturing.
Dr. de Geus is active in the business community as a member of the board of Applied Materials, the Silicon Valley Leadership Group (SVLG), TechNet, the Fabless Semiconductor Association (FSA), and as Vice Chairman of the Electronic Design Automation Consortium (EDAC).
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